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Vibration Stability Monitoring

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Sigenic’s Robotics Stability Solution provides comprehensive, real-time monitoring of the condition of targeted robots. The solution can be used for preventing unwanted excursions and identifying abnormalities. This reduces error rates, boosts quality, increases reliability, and optimizes throughput.  

01    Robot Stability 

Figure 1. Chunk Pin Undercut Behavior

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Vibrations often carry essential information about the robotic arm's stability, potential mechanical wear, and environmental interactions. 

Figure 2 Robot Arm Free Play Behaviour

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Real-time monitoring of vibrations empowers users to make rapid adjustments or even halt operations if necessary, preventing excursion and minimizing downtime. 

Our advanced software captures and analyzes vibration data in real-time, processing massive quantities of information. This ensures that even the slightest irregularities are promptly detected, triggering immediate alerts to engineers for necessary actions.

Figure 3 Historical Chart

Serebro's historical chart provides insights into performance trends, aiding in maintenance decisions. Rapid alerts not only prevent malfunctions from worsening but also minimize downtime. 

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One point stands for

1 wafer target move vibration behavior

Multiple points can be selected to compare behavior

Undesired behavior can be configured through SPC control for real-time alert to users 

02    Padcon Stability

Sigenic’s system deploys vibration sensors and strategically placed them within the CMP apparatus to capture vibrations generated during the process. These vibrations, often indicative of variations in material removal or pad-wafer contact, serve as invaluable real-time feedback. Sigenic’s system Serebro can analyze these signals in real-time and provide engineers insights into the stability of the CMP process, identifying irregularities that may compromise its efficiency or precision. 

Figure 4. Padcon harmonic unstable 

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Chemical Mechanical Polarisation (CMP), is a crucial process in semiconductor manufacturing, involves the simultaneous chemical and mechanical interactions between a polishing pad, slurry, and wafer surface.

Maintaining stable conditions of CMP process is vital to chipset production

03 Reticle Mask (Rema) Stability


Maintaining the utmost precision and stability during the lithography process is paramount.

Using Sigenic’s vibration system, the stability of the reticle mask (REMA) on the lithography machine can be effectively safeguarded, thereby preventing detrimental consequences such as incorrect exposure patterns caused by slippage blades.

Figure 5. REMA Scanning blades movement unstable, blade slippage cause light leak issue.

The reticle mask, a critical component in this process, any degree of instability or movement in the reticle mask can have profound consequences on the final product.

Poor stability of Rema blades movement results in undesired extra pattern on the wafer


04 Pump Condition Monitoring

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The precise and reliable functioning of pumps is crucial for maintaining optimal manufacturing processes.

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Figure 5. Pump bearing worn out cause unbalanced rotation.

By utilizing advanced vibration sensors strategically placed on the pumps, engineers can gather real-time data on mechanical vibrations generated during pump operation. This data provides insights into the pump's condition, analyzing these vibrations allows for the early detection of potential issues, enabling proactive maintenance and minimizing downtime. 

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